DocumentCode
3373539
Title
Temperature Dependent Mechanical Properties of Doped Silicon Microcantilevers
Author
Lee, J. ; Goericke, F.T. ; King, W.P.
Author_Institution
Georgia Inst. of Technol., Atlanta
fYear
2007
fDate
10-14 June 2007
Firstpage
603
Lastpage
606
Abstract
This paper reports temperature dependent resonance frequency and quality factor of microcantilevers over the temperature range 25-175degC. Either local heating from integrated solid state resistors or uniform heating on a hotplate were employed. The microcantilevers were made of either boron-doped or phosphorus-doped single crystalline silicon. Both cantilever types showed decreasing resonant frequency with increasing temperature, and the cantilever mechanical quality factor was not a function of temperature over the temperature range tested. The presence of a silicon dioxide layer adjacent to the cantilever can affect the cantilever mechanical response, and so care must be taken to eliminate this layer.
Keywords
Q-factor; cantilevers; micromechanical devices; resistors; semiconductor doping; boron-doped single crystalline silicon; doped silicon microcantilevers; hotplate; integrated solid state resistors; phosphorus-doped single crystalline silicon; quality factor; temperature 25 degC to 175 degC; temperature dependent mechanical properties; temperature dependent resonance frequency; Heating; Mechanical factors; Q factor; Resistors; Resonance; Resonant frequency; Silicon; Solid state circuits; Temperature dependence; Temperature distribution; microcantilever; quality factor; resonance frequency; stress; temaperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location
Lyon
Print_ISBN
1-4244-0842-3
Electronic_ISBN
1-4244-0842-3
Type
conf
DOI
10.1109/SENSOR.2007.4300202
Filename
4300202
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