• DocumentCode
    3373967
  • Title

    High Throughput Cell Electroporation Array Fabricated by Single-Mask Inclined UV Lithography Exposure and Oxygen Plasma Etching

  • Author

    Suzuki, Takaaki ; Yamamoto, Hideo ; Ohoka, Masataka ; Okonogi, Atsuhito ; Kabata, Hiroyuki ; Kanno, Isaku ; Washizu, Masao ; Kotera, Hidetoshi

  • fYear
    2007
  • fDate
    10-14 June 2007
  • Firstpage
    687
  • Lastpage
    690
  • Abstract
    In this paper, we propose a multiple cell treatment array with high-density arrayed micro-orifice having an individually accessible microchannel and electrodes. More than 10000 micro-orifices with the diameter of 2 mum can be simultaneously fabricated by Single-Mask inclined UV photolithography for embedded network (SIMPLE) process with the oxygen plasma etching. More than 200 living cells immobilized at the arrayed micro-orifices were permeabilized by electroporation and allowed to uptake an foreign impermeant substance.
  • Keywords
    biological techniques; cellular biophysics; electrodes; masks; microfluidics; sputter etching; ultraviolet lithography; electrodes; embedded network; high throughput cell electroporation array; high-density arrayed micro-orifice; individually accessible microchannel; living cells; multiple cell treatment array; oxygen plasma etching; single-mask inclined UV lithography exposure; single-mask inclined UV photolithography; Etching; Lithography; Microchannel; Orifices; Oxygen; Plasma applications; Rough surfaces; Sensor arrays; Surface morphology; Throughput; Electroporation; Inclined Lithography; Oxygen Plasma Etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
  • Conference_Location
    Lyon
  • Print_ISBN
    1-4244-0842-3
  • Electronic_ISBN
    1-4244-0842-3
  • Type

    conf

  • DOI
    10.1109/SENSOR.2007.4300223
  • Filename
    4300223