DocumentCode
3374141
Title
Si Memristive devices applied to memory and neuromorphic circuits
Author
Jo, Sung Hyun ; Kim, Kuk-Hwan ; Chang, Ting ; Gaba, Siddharth ; Lu, Wei
Author_Institution
Electr. Eng. & Comput. Sci., Univ. of Michigan - Ann Arbor, Ann Arbor, MI, USA
fYear
2010
fDate
May 30 2010-June 2 2010
Firstpage
13
Lastpage
16
Abstract
We report studies on nanoscale Si-based memristive devices for memory and neuromorphic applications. The devices are based on ion motion inside an insulating a-Si matrix. Digital devices show excellent performance metrics including scalability, speed, ON/OFF ratio, endurance and retention. High density non-volatile memory arrays based on a crossbar structure have been fabricated and tested. Devices inside a 1kb array can be individually addressed with excellent reproducibility and reliability. By adjusting the device and material structures, nanoscale analog memristor devices have also been demonstrated. The analog memristor devices exhibit incremental conductance changes that are controlled by the charge flown through the device. The performances of the digital and analog devices are thought to be determined by the formation of a dominant conducting filament and the continuous motion of a uniform conduction front, respectively.
Keywords
elemental semiconductors; memristors; random-access storage; silicon; Si; high density nonvolatile memory arrays; insulating a-Si matrix; ion motion; memory circuits; memristive devices; neuromorphic circuits; Circuits; Insulation; Measurement; Memristors; Nanoscale devices; Neuromorphics; Nonvolatile memory; Reproducibility of results; Scalability; Testing; crossbar; memristor; neuromorphic circuit; non-volatile memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems (ISCAS), Proceedings of 2010 IEEE International Symposium on
Conference_Location
Paris
Print_ISBN
978-1-4244-5308-5
Electronic_ISBN
978-1-4244-5309-2
Type
conf
DOI
10.1109/ISCAS.2010.5537135
Filename
5537135
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