DocumentCode
3374612
Title
Design and characterisation of a high precision resistor ladder test structure
Author
Tuinhout, H.P. ; Hoogzaad, G. ; Vertregt, M. ; Roovers, R.L.J. ; Erdmann, C.
Author_Institution
Philips Res., Eindhoven, Netherlands
fYear
2002
fDate
8-11 April 2002
Firstpage
223
Lastpage
228
Abstract
A new sub-site stepped multi-resistor test structure for characterising small resistance mismatch effects in resistor ladders is introduced. Using a Kelvin measurement method and a statistical data evaluation technique, this approach enables identification of very small (<0.05%) systematic mismatch patterns, which are associated with local mechanical stress as well as nanometre scale mask writing artifacts.
Keywords
integrated circuit layout; integrated circuit testing; statistical analysis; thin film resistors; Kelvin measurement method; high precision resistor ladder test structure; local mechanical stress; nanometre scale mask writing artifacts; resistance mismatch effects; statistical data evaluation technique; sub-site stepped multi-resistor test structure; systematic mismatch patterns; Circuit testing; Electrical resistance measurement; Integrated circuit testing; Kelvin; Resistors; Semiconductor device testing; Stress; Switches; System testing; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 2002. ICMTS 2002. Proceedings of the 2002 International Conference on
Print_ISBN
0-7803-7464-9
Type
conf
DOI
10.1109/ICMTS.2002.1193200
Filename
1193200
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