Title :
Systematic mismatch in diffusion resistors caused by photolithography
Author :
Hausser, Stefan ; Majoni, Stefan ; Schligtenhorst, Holger ; Kolwe, Georg
Author_Institution :
Philips Semicond. GmbH, Boeblingen, Germany
Abstract :
During the qualification of a 0.35μm CMOS process, it was observed that diffusion resistors showed a systematic mismatch, depending on the position on the wafer. The mismatch increased from the center of the wafer to the outer regions. Various experiments showed that the mismatch was caused by spinning the wafer during the resist development process. Changing this process eliminated the systematic diffusion resistor mismatch.
Keywords :
CMOS integrated circuits; diffusion; photolithography; photoresists; resistors; 0.35 micron; CMOS process qualification; diffusion resistor mismatch; photolithography; resist development; wafer spinning; CMOS process; Electrical resistance measurement; Immune system; Lithography; Metallization; Probes; Qualifications; Resistors; Silicon; Testing;
Conference_Titel :
Microelectronic Test Structures, 2002. ICMTS 2002. Proceedings of the 2002 International Conference on
Print_ISBN :
0-7803-7464-9
DOI :
10.1109/ICMTS.2002.1193204
