Title :
Efficiency based design flow for fully-integrated class C RF power amplifiers in nanometric CMOS
Author :
Barabino, Nicolás ; Fiorelli, Rafaella ; Silveira, Fernando
Author_Institution :
Inst. de Ing. Electr., Univ. de la Republica Montevideo, Montevideo, Uruguay
fDate :
May 30 2010-June 2 2010
Abstract :
In this work a design flow for class C radiofrequency (RF) power amplifiers (PA) with on-chip output networks in nanometric technologies is presented. This is a new parasitic-aware method intended to reduce time-consuming iterations which are normally required in fully-integrated designs. Unlike other methods it is based on actual transistors DC characteristics and inductors data both extracted by simulation. Starting from the output power specifications a design space map is generated showing the trade-offs between efficiency and components sizing, thus enabling the selection of the most appropriate design that satisfies the harmonic distortion requirements. As a proof of concept of the proposed method, a design example for an IEEE 802.15.4 2.4 GHz PA in a 90 nm CMOS technology is presented.
Keywords :
CMOS integrated circuits; WiMax; harmonic distortion; inductors; network-on-chip; powder cores; power amplifiers; radiofrequency amplifiers; transistors; CMOS technology; IEEE 802.15.4; actual transistors DC characteristics; class C radiofrequency power amplifiers; design flow; design space map; fully-integrated class C RF power amplifiers; fully-integrated designs; harmonic distortion requirements; inductors; nanometric CMOS; nanometric technology; on-chip output networks; output power specifications; parasitic-aware method; time-consuming iterations; CMOS technology; Data mining; Harmonic distortion; Inductors; Network-on-a-chip; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Space technology;
Conference_Titel :
Circuits and Systems (ISCAS), Proceedings of 2010 IEEE International Symposium on
Conference_Location :
Paris
Print_ISBN :
978-1-4244-5308-5
Electronic_ISBN :
978-1-4244-5309-2
DOI :
10.1109/ISCAS.2010.5537207