DocumentCode :
3375562
Title :
An efficient method to screen resistive opens under presence of process variation
Author :
Wang, Seongmoon
Author_Institution :
Samsung Austin Semicond., SARC, Austin, TX, USA
fYear :
2011
fDate :
1-5 May 2011
Firstpage :
122
Lastpage :
127
Abstract :
In this paper, a cost efficient test methodology to screen chips that have resistive open defects under the presence of process variation is proposed. The proposed test methodology is based on small delay defect testing. The entire test session is divided into several subsessions. In each subsession, test patterns are applied with a different frequency of test clock, all of which are faster than the rated clock. Unlike others, different test patterns are generated and applied in each subsession to reduce test application time. A simple three step screening method is also proposed. The first step identifies scan outputs that can fail only if there are defects under the possible worst case process variation. In the second step, we assume that a chip failed due to a defect if the number of faulty scan outputs in a test pattern is much larger than that of faulty scan outputs of a typical defect free chip. Finally, the third step screens defective chips by comparing the number of fail patterns. Among 10 benchmark circuits used for the experiments, the proposed method was able to screen successfully more than 90% of defective chips for 8 circuits.
Keywords :
automatic test pattern generation; integrated circuit interconnections; integrated circuit testing; faulty scan; process variation; resistive open defect; resistive open screening; test clock; test patterns; Automatic test pattern generation; Circuit faults; Clocks; Delay; Logic gates; Silicon; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Test Symposium (VTS), 2011 IEEE 29th
Conference_Location :
Dana Point, CA
ISSN :
1093-0167
Print_ISBN :
978-1-61284-657-6
Type :
conf
DOI :
10.1109/VTS.2011.5783771
Filename :
5783771
Link To Document :
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