DocumentCode
3376605
Title
A comparative study between a micromechanical cantilever resonator and MEMS-based passives for band-pass filtering application
Author
Basu, Joydeep ; Bhattacharya, A. ; Chakraborty, Subha ; Bhattacharyya, T.K.
Author_Institution
Dept. of Electron. & Electr. Commun. Eng., IIT Kharagpur, Kharagpur, India
fYear
2011
fDate
14-16 Jan. 2011
Firstpage
247
Lastpage
252
Abstract
Over the past few years, significant growth has been observed in using MEMS based passive components in the RF microelectronics domain, especially in transceiver components. This is due to some excellent properties of the MEMS devices like low loss, excellent isolation etc. in the microwave frequency domain where the on-chip passives normally tend to become leakier and degrades the transceiver performance. This paper presents a comparative analysis between MEMS-resonator based and MEMS-passives based band-pass filter configurations for RF applications, along with their design, simulation, fabrication and characterization. The filters were designed to have a center frequency of 455 kHz, meant for use as the intermediate frequency (IF) filter in superheterodyne receivers. The filter structures have been fabricated in PolyMUMPs process, a three-polysilicon layer surface micromachining process.
Keywords
band-pass filters; cantilevers; micromachining; micromechanical resonators; microwave filters; microwave integrated circuits; passive filters; radio transceivers; superheterodyne receivers; MEMS based passive component; PolyMUMP process; RF microelectronics domain; band-pass filtering application; filter design; frequency 455 kHz; intermediate frequency filter; micromechanical cantilever resonator; microwave frequency domain; superheterodyne receiver; three-polysilicon layer surface micromachining process; transceiver component; Band pass filters; Electrodes; Filtering theory; Micromechanical devices; Resonant frequency; Resonator filters; Varactors;
fLanguage
English
Publisher
ieee
Conference_Titel
Students' Technology Symposium (TechSym), 2011 IEEE
Conference_Location
Kharagpur
Print_ISBN
978-1-4244-8941-1
Type
conf
DOI
10.1109/TECHSYM.2011.5783824
Filename
5783824
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