DocumentCode
3376667
Title
Spatially resolved silicon solar cell characterization using infrared imaging methods
Author
Kasemann, M.A. ; Kwapil, W. ; Schubert, M.C. ; Habenicht, H. ; Walter, B. ; The, M. ; Kontermann, S. ; Rein, S. ; Breitenstein, O. ; Bauer, J. ; Lotnyk, A. ; Michl, B. ; Nagel, H. ; Schutt, A. ; Carstensen, J. ; Foll, H. ; Trupke, T. ; Augarten, Y. ; Kamp
Author_Institution
Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstr. 2, 79110 Freiburg, Germany
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
7
Abstract
We present a comprehensive overview over infrared imaging techniques for (electrical) silicon solar cell characterization. Recent method development in local series resistance imaging is reviewed in more detail and new results in local breakdown investigations on multicrystalline (mc) silicon solar cells are reported. We observe local junction breakdown sites on industrial mc-cells at reverse voltages as low as −7V and breakdown in great areas of the cell at voltages around −14V. As these breakdown sites (as well as local shunts) can cause hot spots which can damage the cell and the module, we also present an ultra-fast, simple and quantitative method for hot-spot detection. Typical measurement times in the order of 10 milliseconds are achieved.
Keywords
Breakdown voltage; Electric breakdown; Electric resistance; Image resolution; Infrared imaging; Low voltage; Optical imaging; Photovoltaic cells; Silicon; Spatial resolution;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922478
Filename
4922478
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