• DocumentCode
    3377007
  • Title

    Characterisation of bulk GaSb using TCAD

  • Author

    Ali, Farida A. ; Pattnaik, P. ; Kamilla, S.K.

  • Author_Institution
    Semicond. Res. Lab., Siksha O Anusandhan Univ., Bhubaneswar, India
  • fYear
    2011
  • fDate
    14-16 Jan. 2011
  • Firstpage
    211
  • Lastpage
    213
  • Abstract
    The III-V compounds have turned out to be promising candidates for high speed electronics and photonic devices. Among III-V compounds, gallium antimonide (GaSb) is particularly interesting as a substrate material because its lattice parameter matches solid solutions of various ternary and quaternary III-V compounds whose band gaps cover a wide spectral range. These have stimulated a lot of interest in GaSb for basic research in materials as well as device fabrication. In this paper, investigation is done for the hole transport property of bulk GaSb with intrinsic concentration 1.5×1015 cm-3. Hole concentration and mobility of bulk GaSb were investigated by simulation method using the device simulation software ATLAS (SILVACO) in the temperature range from 77K to 320K in an interval of 5K and 10K. It also shows that the effective hole mobility is about 461 cm2/Vs with the concentration ≈ 1.5 × 1015 cm-3 at room temperature i.e. 300K. It has been found that the effective mobility is affected by ionized impurity scattering; in contrast at higher temperatures (≈ 300K) acoustic, polar optical and non-polar optical scattering processes dominate the mobility. The agreement of simulated data with that of reported experimental data is found to be satisfactory.
  • Keywords
    III-V semiconductors; energy gap; gallium compounds; high-speed integrated circuits; hole mobility; semiconductor device manufacture; solid solutions; technology CAD (electronics); ATLAS; GaSb; SILVACO; TCAD; acoustic optical scattering process; band gaps; device fabrication; device simulation software; gallium antimonide; high speed electronics; hole concentration; hole mobility; hole transport property; intrinsic concentration; ionized impurity scattering; lattice parameter; nonpolar optical scattering process; photonic devices; quaternary III-V compounds; simulation method; solid solutions; spectral range; substrate material; temperature 77 K to 320 K; Anodes; Cathodes; HEMTs; MODFETs; Optical scattering; GaSb; compound semiconductor; mobility; scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Students' Technology Symposium (TechSym), 2011 IEEE
  • Conference_Location
    Kharagpur
  • Print_ISBN
    978-1-4244-8941-1
  • Type

    conf

  • DOI
    10.1109/TECHSYM.2011.5783847
  • Filename
    5783847