DocumentCode
3377742
Title
Temperature coefficients of SAW velocity for AlN thin film sputtered on ST-X quartz
Author
Kao, Kuo-Sheng ; Chen, Ying-Chunng ; Lee, Yi-Hung ; Cheng, Chien-Chuan
Author_Institution
Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
Volume
1
fYear
2002
fDate
8-11 Oct. 2002
Firstpage
239
Abstract
Highly c-axis prefer-oriented aluminum nitride (AlN) thin films deposited on the Y-rotated, X-propagating, (ST-X), cut of quartz substrates were obtained by reactive rf magnetron sputtering to investigate the temperature coefficient of frequency (TCF) for surface acoustic wave (SAW) devices. The experimental results show that the slope of the temperature dependence of the center frequency of the SAW device on ST-X quartz substrate was doubtless zero and the TCF was calculated to be 0 ppm/°C. As compared, with AlN film on ST-X quartz, the TCF was measured to be about 16 ppm/°C with h/λ=0.05, where h was the AIN film thickness and λ was the wavelength of SAW. The AlN/ST-X quartz based structure could also improve the acoustic wave velocity of SAW devices.
Keywords
III-V semiconductors; acoustic wave velocity; aluminium compounds; quartz; semiconductor thin films; substrates; surface acoustic wave devices; surface acoustic waves; wide band gap semiconductors; AlN; AlN thin film; SAW devices; ST-X quartz; SiO2; acoustic wave velocity; quartz substrates; surface acoustic wave; temperature coefficient of frequency; temperature dependence; Acoustic waves; Aluminum nitride; Frequency; Magnetic devices; Sputtering; Substrates; Surface acoustic wave devices; Surface acoustic waves; Temperature; Thin film devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium, 2002. Proceedings. 2002 IEEE
ISSN
1051-0117
Print_ISBN
0-7803-7582-3
Type
conf
DOI
10.1109/ULTSYM.2002.1193392
Filename
1193392
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