DocumentCode
3378018
Title
Optofluidic Maskless Lithography System
Author
Chung, Su E. ; Park, Wook ; Park, Hyunsung ; Yu, Kyoungsik ; Park, Namkyoo ; Kwon, Sunghoon
Author_Institution
Seoul Nat. Univ., Seoul
fYear
2007
fDate
10-14 June 2007
Firstpage
1569
Lastpage
1572
Abstract
We propose and demonstrate an optofluidic maskless lithography technique to fabricate various polymer microparticles and microwires in microfluidic channels. Combining maskless lithography and microfluidic systems, we demonstrate temporal and spatial control of polymeric micro structure generation in microfluidic channels.
Keywords
lithography; microchannel flow; photolithography; polymers; microfluidic channels; microfluidic systems; microwires; optofluidic maskless lithography system; polymer microparticles; polymeric micro structure generation; spatial control; temporal control; Control systems; Lithography; Microfluidics; Micromechanical devices; Micromirrors; Microstructure; Optical modulation; Optical polymers; Shape control; Streaming media; Maskless lithography; Microfluidics; Optofluidics; Polymer bead;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location
Lyon
Print_ISBN
1-4244-0842-3
Electronic_ISBN
1-4244-0842-3
Type
conf
DOI
10.1109/SENSOR.2007.4300446
Filename
4300446
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