DocumentCode :
3378080
Title :
Micro Proximity Electron Source with Apertured Electron Window for Nanolithography in Atmosphere
Author :
Cho, Wonje ; Ono, Takahito ; Esashi, Masayoshi
Author_Institution :
Tohoku Univ., Sendai
fYear :
2007
fDate :
10-14 June 2007
Firstpage :
1581
Lastpage :
1584
Abstract :
A miniature electron source with small electron windows for use in atmospheric environment has been developed. Electron windows made of 50-nm thick silicon with sizes of 250 nm diameter and 1.5 mum square are fabricated at the bottom of an aperture. Electrons from carbon nanocoils as emitters can be emitted by field emission and transmitted into atmospheric pressure via submicron electron window. The transmittance via the electron window and current density are evaluated to be 4% and 90 pA/mum2 , respectively. At the acceleration voltage of 10 kV, electrons penetrated the electron window, ant its pattern was transferred on resist.
Keywords :
electron sources; nanolithography; resists; apertured electron window; atmospheric environment; carbon nanocoils; current density; microproximity electron source; nanolithography; resist; silicon; voltage 10 kV; Acceleration; Apertures; Atmosphere; Carbon dioxide; Current density; Electron emission; Electron sources; Nanolithography; Silicon; Voltage; carbon nanocoils; electron source; electron window; field emission; nanolithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
Type :
conf
DOI :
10.1109/SENSOR.2007.4300449
Filename :
4300449
Link To Document :
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