• DocumentCode
    3378080
  • Title

    Micro Proximity Electron Source with Apertured Electron Window for Nanolithography in Atmosphere

  • Author

    Cho, Wonje ; Ono, Takahito ; Esashi, Masayoshi

  • Author_Institution
    Tohoku Univ., Sendai
  • fYear
    2007
  • fDate
    10-14 June 2007
  • Firstpage
    1581
  • Lastpage
    1584
  • Abstract
    A miniature electron source with small electron windows for use in atmospheric environment has been developed. Electron windows made of 50-nm thick silicon with sizes of 250 nm diameter and 1.5 mum square are fabricated at the bottom of an aperture. Electrons from carbon nanocoils as emitters can be emitted by field emission and transmitted into atmospheric pressure via submicron electron window. The transmittance via the electron window and current density are evaluated to be 4% and 90 pA/mum2 , respectively. At the acceleration voltage of 10 kV, electrons penetrated the electron window, ant its pattern was transferred on resist.
  • Keywords
    electron sources; nanolithography; resists; apertured electron window; atmospheric environment; carbon nanocoils; current density; microproximity electron source; nanolithography; resist; silicon; voltage 10 kV; Acceleration; Apertures; Atmosphere; Carbon dioxide; Current density; Electron emission; Electron sources; Nanolithography; Silicon; Voltage; carbon nanocoils; electron source; electron window; field emission; nanolithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
  • Conference_Location
    Lyon
  • Print_ISBN
    1-4244-0842-3
  • Electronic_ISBN
    1-4244-0842-3
  • Type

    conf

  • DOI
    10.1109/SENSOR.2007.4300449
  • Filename
    4300449