• DocumentCode
    3378224
  • Title

    Diagonal MOSFETs characterization for 256M DRAM and beyond

  • Author

    Hu, Yin ; Teng, Clarence W. ; Coleman, Donald J., Jr. ; Richardson, William F. ; Liu, Jiann ; Ho, Chi-Chien ; Aur, Shian

  • Author_Institution
    Semicond. Process & Design Center, Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    1995
  • fDate
    31 May-2 Jun 1995
  • Firstpage
    309
  • Lastpage
    313
  • Abstract
    A diagonal MOSFET structure has been designed, fabricated and characterized for 256M DRAM and other general applications. The effective W/L ratio is found to play a very important role in diagonal MOSFET´s characteristics because of its three dimensional current flow pattern. In general, the diagonal MOSFETs have lower drive current but Vt is less sensitive to the scaling in device channel length and width. Our experimental results show that Channel Hot Carrier (CHC) degradation of diagonal MOSFETs is similar to that of conventional MOSFETs, despite the current crowding effect in the diagonal MOSFETs
  • Keywords
    DRAM chips; MOS memory circuits; MOSFET; hot carriers; 256 Mbit; DRAMs; channel hot carrier degradation; current crowding; diagonal MOSFETs; drive current; three dimensional current flow; threshold voltage; width/length ratio; Capacitors; Degradation; Hot carriers; Instruments; MOSFETs; Proximity effect; Random access memory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications, 1995. Proceedings of Technical Papers. 1995 International Symposium on
  • Conference_Location
    Taipei
  • ISSN
    1524-766X
  • Print_ISBN
    0-7803-2773-X
  • Type

    conf

  • DOI
    10.1109/VTSA.1995.524709
  • Filename
    524709