DocumentCode :
3378304
Title :
Deposition phase diagram of micro-crystalline silicon and optical emission spectroscopy study in PECVD process
Author :
Sun, Zhenzhong ; Liu, Fengzhen ; Zhu, Meifang ; Zhou, Yuqin ; Zi, Wei ; Li, Chaowei
Author_Institution :
College of Physical Sciences, Graduate University, Chinese Academy of Sciences, Beijing, 100049, China
fYear :
2008
fDate :
11-16 May 2008
Firstpage :
1
Lastpage :
4
Abstract :
In this study, a deposition phase diagram was established based on the combinational variable of Pw/pg to denote the phase transition of the silicon thin films. The spatially resolved plasma emission profiles were measured to reveal the effect of PW/pg on the plasma emission. The influence of PW/pg and RH on the phase transition of silicon films was discussed.
Keywords :
Silicon; Spectroscopy; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location :
San Diego, CA, USA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-1640-0
Electronic_ISBN :
0160-8371
Type :
conf
DOI :
10.1109/PVSC.2008.4922570
Filename :
4922570
Link To Document :
بازگشت