• DocumentCode
    3378628
  • Title

    A novel power High Electron Mobility Transistor with partial stepped recess in the drain access region for performance improvement

  • Author

    Rajabi, Saba ; Orouji, Ali Asghar ; Moghadam, H.A. ; Mahabadi, S. E. Jamali

  • Author_Institution
    Electr. Eng. Dept., Semnan Univ., Semnan, Iran
  • fYear
    2011
  • fDate
    21-22 July 2011
  • Firstpage
    269
  • Lastpage
    271
  • Abstract
    In this letter, we proposed a new power High Electron Mobility Transistor (HEMT) with partial stepped recess in the drain access region. This approach represents a new way to increase the breakdown voltage by 100%, which is very important in higher voltage applications. The use of drain access region recesses allows a 43% decrease of the peak electric field and only a 1.91% increase of the drain access resistance which is negligible. The proposed structure shows an improvement in the maximum oscillation frequency (fmax) and cut-off frequency (fT) over the conventional structure.
  • Keywords
    high electron mobility transistors; power field effect transistors; semiconductor device breakdown; AlxGa1-xN-GaN; HEMT; breakdown voltage; cut-off frequency; drain access region; drain access resistance; maximum oscillation frequency; partial stepped recess; performance improvement; power high electron mobility transistor; Aluminum gallium nitride; Gallium nitride; HEMTs; MODFETs; Semiconductor device reliability; Switches; AlGaN/GaN high electron mobility transistor (HEMT); breakdown voltage; electric field; gate recess; maximum oscillation frequency; partial stepped recess;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Signal Processing, Communication, Computing and Networking Technologies (ICSCCN), 2011 International Conference on
  • Conference_Location
    Thuckafay
  • Print_ISBN
    978-1-61284-654-5
  • Type

    conf

  • DOI
    10.1109/ICSCCN.2011.6024557
  • Filename
    6024557