DocumentCode
3378628
Title
A novel power High Electron Mobility Transistor with partial stepped recess in the drain access region for performance improvement
Author
Rajabi, Saba ; Orouji, Ali Asghar ; Moghadam, H.A. ; Mahabadi, S. E. Jamali
Author_Institution
Electr. Eng. Dept., Semnan Univ., Semnan, Iran
fYear
2011
fDate
21-22 July 2011
Firstpage
269
Lastpage
271
Abstract
In this letter, we proposed a new power High Electron Mobility Transistor (HEMT) with partial stepped recess in the drain access region. This approach represents a new way to increase the breakdown voltage by 100%, which is very important in higher voltage applications. The use of drain access region recesses allows a 43% decrease of the peak electric field and only a 1.91% increase of the drain access resistance which is negligible. The proposed structure shows an improvement in the maximum oscillation frequency (fmax) and cut-off frequency (fT) over the conventional structure.
Keywords
high electron mobility transistors; power field effect transistors; semiconductor device breakdown; AlxGa1-xN-GaN; HEMT; breakdown voltage; cut-off frequency; drain access region; drain access resistance; maximum oscillation frequency; partial stepped recess; performance improvement; power high electron mobility transistor; Aluminum gallium nitride; Gallium nitride; HEMTs; MODFETs; Semiconductor device reliability; Switches; AlGaN/GaN high electron mobility transistor (HEMT); breakdown voltage; electric field; gate recess; maximum oscillation frequency; partial stepped recess;
fLanguage
English
Publisher
ieee
Conference_Titel
Signal Processing, Communication, Computing and Networking Technologies (ICSCCN), 2011 International Conference on
Conference_Location
Thuckafay
Print_ISBN
978-1-61284-654-5
Type
conf
DOI
10.1109/ICSCCN.2011.6024557
Filename
6024557
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