DocumentCode
3379579
Title
SILC-based reassignment of trapping and trap generation regimes of positive bias temperature instability
Author
Yang, J.Q. ; Masuduzzman, M. ; Kang, J.F. ; Alam, M.A.
Author_Institution
Dept. of ECE, Purdue Univ., West Lafayette, IN, USA
fYear
2011
fDate
10-14 April 2011
Abstract
We report a simple but effective SILC-based methodology to separate and identify trapping and trap generation dominated regimes of positive bias temperature instability (PBTI). We use theoretical model and experiments to demonstrate that the sign for stress induced leakage current (SILC) reverses as PBTI transitions from trapping to trap generation dominated regimes; this is in contrast to threshold voltage shift with no corresponding sign reversal. SILC crossover methodology further verifies that initial and fast saturated trapping is temperature independent while trap generation is voltage and temperature activated. The SILC-based reassignment not only indentifies trapping and trap generation regimes of PBTI, but also suggests a remarkable universality of trap generation in wide variety of High-k samples.
Keywords
MOSFET; high-k dielectric thin films; leakage currents; PBTI; SILC-based reassignment; high-k MOSFET; positive bias temperature instability; stress induced leakage current; temperature independence; threshold voltage shift; trap generation regimes; Charge carrier processes; Degradation; Dielectrics; Noise; Stress; Temperature measurement; Transient analysis; Trap Generation; Trapping; positive bias temperature instability (PBTI); stress induced leakage current (SILC);
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2011 IEEE International
Conference_Location
Monterey, CA
ISSN
1541-7026
Print_ISBN
978-1-4244-9113-1
Electronic_ISBN
1541-7026
Type
conf
DOI
10.1109/IRPS.2011.5784476
Filename
5784476
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