• DocumentCode
    3379579
  • Title

    SILC-based reassignment of trapping and trap generation regimes of positive bias temperature instability

  • Author

    Yang, J.Q. ; Masuduzzman, M. ; Kang, J.F. ; Alam, M.A.

  • Author_Institution
    Dept. of ECE, Purdue Univ., West Lafayette, IN, USA
  • fYear
    2011
  • fDate
    10-14 April 2011
  • Abstract
    We report a simple but effective SILC-based methodology to separate and identify trapping and trap generation dominated regimes of positive bias temperature instability (PBTI). We use theoretical model and experiments to demonstrate that the sign for stress induced leakage current (SILC) reverses as PBTI transitions from trapping to trap generation dominated regimes; this is in contrast to threshold voltage shift with no corresponding sign reversal. SILC crossover methodology further verifies that initial and fast saturated trapping is temperature independent while trap generation is voltage and temperature activated. The SILC-based reassignment not only indentifies trapping and trap generation regimes of PBTI, but also suggests a remarkable universality of trap generation in wide variety of High-k samples.
  • Keywords
    MOSFET; high-k dielectric thin films; leakage currents; PBTI; SILC-based reassignment; high-k MOSFET; positive bias temperature instability; stress induced leakage current; temperature independence; threshold voltage shift; trap generation regimes; Charge carrier processes; Degradation; Dielectrics; Noise; Stress; Temperature measurement; Transient analysis; Trap Generation; Trapping; positive bias temperature instability (PBTI); stress induced leakage current (SILC);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2011 IEEE International
  • Conference_Location
    Monterey, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4244-9113-1
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2011.5784476
  • Filename
    5784476