Title :
Quarter- and sub-quarter-micron optical lithography
Author_Institution :
IBM Gen. Technol. Div., Hopewell Junction, NJ, USA
Abstract :
Will optical lithography finally have reached its ultimate limit at a quarter micrometer minimum feature size? The author shows the obstacles in the projection and the resist systems that prevent optical lithography from performing at its theoretical limit as well as means to further extend the theoretical limit. The requirements on the mask, the projection optics, the resist, and the alignment system to support quarter-and sub-quarter-micrometer optical lithography are covered
Keywords :
integrated circuit technology; photolithography; 0.25 micron; alignment system; depth of focus budget; minimum feature size; projection optics; quarter-micron optical lithography; resist systems; sub-quarter-micron optical lithography; Circuits; Focusing; Lithography; Optical distortion; Optical imaging; Optical refraction; Optical sensors; Optical variables control; Resists; Surfaces;
Conference_Titel :
VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on
Conference_Location :
Taipei
Print_ISBN :
0-7803-0036-X
DOI :
10.1109/VTSA.1991.246720
