Title :
Quantitative, nanoscale free-carrier concentration mapping using terahertz near-field nanoscopy
Author :
Wittborn, J. ; Weiland, R. ; Huber, A.J. ; Keilmann, F. ; Hillenbrand, R.
Author_Institution :
Infineon Technol. AG, Munich, Germany
Abstract :
We use ultra-resolving terahertz (THz) near-field microscopy based on THz scattering at atomic force microscope tips to analyze 65-nm technology node transistors. Nanoscale resolution is achieved by THz field confinement at the very tip apex to within 30 nm. Images of semiconductor transistors provide evidence of 40 nm (λ/3000) spatial resolution at 2.54 THz (wavelength λ = 118μm) and demonstrate the simultaneous THz recognition of materials and mobile carriers in a single nanodevice. The mobile carrier contrast can be clearly related to near-field excitation of THz-plasmons in the semiconductor regions. The extraordinary high sensitivity of our microscope provides THz near-field contrasts from less than 100 mobile electrons in the probed volume.
Keywords :
atomic force microscopy; nanotechnology; THz field confinement; THz plasmons; THz recognition; atomic force microscope tips; frequency 2.54 THz; mobile carrier contrast; nanodevice; nanoscale free-carrier concentration mapping; nanoscale resolution; near-field excitation; node transistors; semiconductor transistor; size 40 nm; size 65 nm; spatial resolution; terahertz near-field nanoscopy; ultra-resolving terahertz near-field microscopy; wavelength 118 mum; Materials; Microscopy; Mobile communication; Nanoscale devices; Spatial resolution; Transistors; atomic force microscope; carrier concentration mapping; microscopy; terahertz near-field;
Conference_Titel :
Reliability Physics Symposium (IRPS), 2011 IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-9113-1
Electronic_ISBN :
1541-7026
DOI :
10.1109/IRPS.2011.5784523