Title :
Process development for tailoring the emitter on sphere shaped silicon structures
Author :
Gharghi, Majid ; Sivoththaman, Siva
Author_Institution :
Center for Advanced Photovoltaic Devices and Systems, Department of Electrical and Computer Engineering, University of Waterloo, Ontario, Canada
Abstract :
A dry process is developed for the etch-back of spherical silicon surfaces, intended for thinning of the emitter in spherical pn photodiode. The process is based on reactive ion etching, and enjoys higher reliability and controllability compared to wet etching. The process conditions are controlled to obtain an angle-dependent selective etch rate across the spherical surface.
Keywords :
Atomic layer deposition; Cathodes; Chemical processes; Controllability; Dry etching; Immune system; Plasma accelerators; Plasma chemistry; Silicon; Wet etching;
Conference_Titel :
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location :
San Diego, CA, USA
Print_ISBN :
978-1-4244-1640-0
Electronic_ISBN :
0160-8371
DOI :
10.1109/PVSC.2008.4922675
