Ti-Ni SMA Film-Actuated 2-D Multi-Probe Array for Scanning Probe Nano-Lithography on a Wide Area

This paper describes design and fabrication of a Ti-Ni shape-memory alloy (SMA) film-actuated single crystal silicon (SCS) multi-probe device utilized for scanning probe nano-lithography (SPNL). This research focuses on the development of the device that can realize fabrication of a nanoscale mask pattern on a few millimeters square area. The designed device consists of Ti-Ni SMA film-actuated 8 times 8 writing-probes with an Au film-coated tip, and 2 times 2 tilt-adjustment probes with a piezo-resistive sensor. The SMA actuation mechanism yields a contact or non-contact state between a probe-tip and a sample surface, which indicates that SPNL turns on or off. The tilt-adjustment system can make a spacing between the device and a wafer constant. We have succeeded in fabricating the SPNL multi-probe array device, which has the potential for realization of accurate mask patterning on a few millimeters square area.