Title :
Extraction of defect characteristics for yield estimation using the double bridge test structure
Author :
Khare, J.B. ; Daniels, B.J. ; Campbell, D.M. ; Thomas, M.E. ; Maly, W.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
Abstract :
Discusses the use of special test structures and algorithms needed to extract the defect characteristics for accurate yield estimation. By using the double bridge test structure, which can be applied to obtain defect size distributions in the metal layer, the basic elements of the defect extraction algorithms are demonstrated. Data from a fabrication experiment is used to illustrate the algorithms
Keywords :
VLSI; bridge instruments; integrated circuit testing; monolithic integrated circuits; defect characteristics; defect extraction; defect size distributions; double bridge test structure; metal layer; yield estimation; Accuracy; Bridges; Contamination; Data mining; Fabrication; Integrated circuit modeling; Manufacturing; Resource management; Testing; Yield estimation;
Conference_Titel :
VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on
Conference_Location :
Taipei
Print_ISBN :
0-7803-0036-X
DOI :
10.1109/VTSA.1991.246755
