DocumentCode
3381615
Title
Challenges and strategies in advanced CMOS technology development
Author
Chen, Xiaomeng
Author_Institution
Semicond. R&D Center, IBM, Hopewell Junction, NY, USA
fYear
2011
fDate
25-28 Oct. 2011
Firstpage
430
Lastpage
432
Abstract
The ongoing drive for increased speed and density of CMOS technology requires the continuous innovation of advanced elements and processes. With the development of new materials also comes new manufacturing challenges. In this paper, we will give an overview on the technology and process challenges, innovation roadmap, and manufacturability strategies. We will also discuss the importance of collaboration in the CMOS business model.
Keywords
CMOS integrated circuits; innovation management; semiconductor device manufacture; CMOS business model; CMOS technology development; innovation roadmap; manufacturability strategy; Business; Epitaxial growth; Implants; Metals; Monitoring; Strain;
fLanguage
English
Publisher
ieee
Conference_Titel
ASIC (ASICON), 2011 IEEE 9th International Conference on
Conference_Location
Xiamen
ISSN
2162-7541
Print_ISBN
978-1-61284-192-2
Electronic_ISBN
2162-7541
Type
conf
DOI
10.1109/ASICON.2011.6157213
Filename
6157213
Link To Document