Title :
A Micromachined Vapor-Jet Vacuum Pump
Author :
Doms, M. ; Müller, J.
Author_Institution :
Hamburg-Harburg Univ. of Technol., Hamburg
Abstract :
A MEMS vapor-jet pump for vacuum generation in miniaturized analytical systems, e.g. micro mass-spectrometers, is presented. A high velocity nitrogen- or water-vapor-jet is used for vacuum generation. Starting from atmospheric pressure, a high throughput of more than 50 ml/min and an ultimate pressure of 495 mbar were obtained with this new type of micropump. An approach for the full integration of all components of the pump is presented and validated by experimental results. The pump is fabricated from silicon and glass substrates using standard MEMS fabrication techniques including DRIE, trichlorosilane MVD and metal-assisted chemical etching for porous silicon fabrication. Micromachined pressure sensors based on the Pirani principle have been developed and integrated into the pump for monitoring.
Keywords :
micromachining; micropumps; sputter etching; vacuum pumps; vapour deposition; DRIE; MEMS vapor-jet pump; deep reactive ion etching; metal-assisted chemical etching; micromachined vapor-jet vacuum pump; micropump; molecular vapor deposition; pressure 495 mbar; trichlorosilane MVD; Chemical sensors; Etching; Fabrication; Glass; Micromechanical devices; Micropumps; Monitoring; Silicon; Throughput; Vacuum systems; Pirani; jet; micropump; pressure; vacuum; vapor;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
DOI :
10.1109/SENSOR.2007.4300660
