• DocumentCode
    3381970
  • Title

    A Micromachined Vapor-Jet Vacuum Pump

  • Author

    Doms, M. ; Müller, J.

  • Author_Institution
    Hamburg-Harburg Univ. of Technol., Hamburg
  • fYear
    2007
  • fDate
    10-14 June 2007
  • Firstpage
    2425
  • Lastpage
    2428
  • Abstract
    A MEMS vapor-jet pump for vacuum generation in miniaturized analytical systems, e.g. micro mass-spectrometers, is presented. A high velocity nitrogen- or water-vapor-jet is used for vacuum generation. Starting from atmospheric pressure, a high throughput of more than 50 ml/min and an ultimate pressure of 495 mbar were obtained with this new type of micropump. An approach for the full integration of all components of the pump is presented and validated by experimental results. The pump is fabricated from silicon and glass substrates using standard MEMS fabrication techniques including DRIE, trichlorosilane MVD and metal-assisted chemical etching for porous silicon fabrication. Micromachined pressure sensors based on the Pirani principle have been developed and integrated into the pump for monitoring.
  • Keywords
    micromachining; micropumps; sputter etching; vacuum pumps; vapour deposition; DRIE; MEMS vapor-jet pump; deep reactive ion etching; metal-assisted chemical etching; micromachined vapor-jet vacuum pump; micropump; molecular vapor deposition; pressure 495 mbar; trichlorosilane MVD; Chemical sensors; Etching; Fabrication; Glass; Micromechanical devices; Micropumps; Monitoring; Silicon; Throughput; Vacuum systems; Pirani; jet; micropump; pressure; vacuum; vapor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
  • Conference_Location
    Lyon
  • Print_ISBN
    1-4244-0842-3
  • Electronic_ISBN
    1-4244-0842-3
  • Type

    conf

  • DOI
    10.1109/SENSOR.2007.4300660
  • Filename
    4300660