DocumentCode
3381970
Title
A Micromachined Vapor-Jet Vacuum Pump
Author
Doms, M. ; Müller, J.
Author_Institution
Hamburg-Harburg Univ. of Technol., Hamburg
fYear
2007
fDate
10-14 June 2007
Firstpage
2425
Lastpage
2428
Abstract
A MEMS vapor-jet pump for vacuum generation in miniaturized analytical systems, e.g. micro mass-spectrometers, is presented. A high velocity nitrogen- or water-vapor-jet is used for vacuum generation. Starting from atmospheric pressure, a high throughput of more than 50 ml/min and an ultimate pressure of 495 mbar were obtained with this new type of micropump. An approach for the full integration of all components of the pump is presented and validated by experimental results. The pump is fabricated from silicon and glass substrates using standard MEMS fabrication techniques including DRIE, trichlorosilane MVD and metal-assisted chemical etching for porous silicon fabrication. Micromachined pressure sensors based on the Pirani principle have been developed and integrated into the pump for monitoring.
Keywords
micromachining; micropumps; sputter etching; vacuum pumps; vapour deposition; DRIE; MEMS vapor-jet pump; deep reactive ion etching; metal-assisted chemical etching; micromachined vapor-jet vacuum pump; micropump; molecular vapor deposition; pressure 495 mbar; trichlorosilane MVD; Chemical sensors; Etching; Fabrication; Glass; Micromechanical devices; Micropumps; Monitoring; Silicon; Throughput; Vacuum systems; Pirani; jet; micropump; pressure; vacuum; vapor;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location
Lyon
Print_ISBN
1-4244-0842-3
Electronic_ISBN
1-4244-0842-3
Type
conf
DOI
10.1109/SENSOR.2007.4300660
Filename
4300660
Link To Document