• DocumentCode
    3382075
  • Title

    On-Chip High Quality Factor CMOS-MEMS Silicon-Fin Resonators

  • Author

    Lo, Chiung-C ; Fedder, Gary K.

  • Author_Institution
    Carnegie Mellon Univ., Pittsburgh
  • fYear
    2007
  • fDate
    10-14 June 2007
  • Firstpage
    2449
  • Lastpage
    2452
  • Abstract
    An in-plane CMOS-MEMS fully differential silicon-fin resonator (SiFR), operating as a cantilever beam at free-clamp mode with a center frequency of 8.04 MHz, quality factor (Q) of 3589, and insertion loss of 33.6 dB is introduced. The resonator was fabricated directly on a conventional CMOS substrate with an on-chip differential amplifier. To enhance the Q, a 2-step silicon etch is employed to harness the high material Q of silicon substrate resulting in more than three times Q enhancement than that of previous CMOS-MEMS resonators.
  • Keywords
    CMOS integrated circuits; Q-factor; differential amplifiers; silicon; CMOS MEMS resonator; CMOS substrate; cantilever beam; differential amplifier; loss 33.6 dB; on-chip high quality factor; silicon-fin resonator; Capacitance; Differential amplifiers; Electrodes; Insertion loss; Microcavities; Q factor; Resonant frequency; Silicon; Structural beams; Voltage; CMOS-MEMS; RF MEMS; high Q; silicon resonator;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
  • Conference_Location
    Lyon
  • Print_ISBN
    1-4244-0842-3
  • Electronic_ISBN
    1-4244-0842-3
  • Type

    conf

  • DOI
    10.1109/SENSOR.2007.4300666
  • Filename
    4300666