DocumentCode
3382474
Title
The atomic hydrogen flux during microcrystalline silicon solar cell deposition
Author
van de Sanden, M.C.M. ; Dingemans, G. ; van den Donker, M.N. ; Hrunski, D. ; Gordijn, A. ; Kessels, W.M.M.
Author_Institution
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, The Netherlands
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
3
Abstract
Etch product detection by in situ optical emission spectroscopy is used to detect the phase transition from amorphous to microcrystalline silicon. In this contribution it is demonstrated that a calibrated version of this technique can be used to determine the absolute hydrogen flux under state-of-the-art silicon thin film deposition conditions.
Keywords
Atom optics; Atomic layer deposition; Etching; Hydrogen; Optical films; Phase detection; Photovoltaic cells; Silicon; Spectroscopy; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922764
Filename
4922764
Link To Document