DocumentCode :
3383008
Title :
N type multicrystalline silicon wafers from an upgraded metallurgical route
Author :
Martinuzzi, S. ; Trassy, C. ; Perichaud, I. ; Degoulange, J.
Author_Institution :
UMR TECSEN CNRS-University Paul Cezanne-Aix-Marseille III - France
fYear :
2008
fDate :
11-16 May 2008
Firstpage :
1
Lastpage :
5
Abstract :
N-type silicon wafers present some definite advantages for photovoltaics, mainly due to the low capture cross sections of minority carriers for most metallic impurities. This peculiarity is beneficial for multicrystalline silicon (mc-Si) wafers. Most importantly, this peculiarity could be of a great interest when mc-Si ingots are produced directly from upgraded and purified metallurgical silicon feedstock. It is of a paramount importance to verify if the advantages of conventional n-type silicon also characterises n-type wafers provided by the direct metallurgical route. It is found, in raw wafers, that minority carrier diffusion lengths are 3 times higher in n-type than in p-type wafers, when the wafers are cut from the same ingot, which the bottom is p- type and the top is n-type. The results confirm the interest for n type silicon.
Keywords :
Chemical analysis; Crystalline materials; Impurities; Optical materials; Photovoltaic cells; Plasma applications; Plasma materials processing; Purification; Silicon; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location :
San Diego, CA, USA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-1640-0
Electronic_ISBN :
0160-8371
Type :
conf
DOI :
10.1109/PVSC.2008.4922790
Filename :
4922790
Link To Document :
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