DocumentCode :
3384261
Title :
Emitter wrap-through structure for rear-side contacting of epitaxial thin-film solar cells
Author :
Mitchell, Emily J. ; Reber, Stefan
Author_Institution :
Fraunhofer Institute for Solar Energy Systems, Heidenhofstr. 2, 79110 Freiburg, Germany
fYear :
2008
fDate :
11-16 May 2008
Firstpage :
1
Lastpage :
5
Abstract :
The Epitaxy Wrap-through (EpiWT) cell concept is introduced. It combines the benefits of rear-side contacting with the low-cost potential of epitaxial crystalline silicon thin-film technology. Its advantage over the standard EWT cell upon which it is based is the simplified rear structuring due to the inactive substrate. This paper focuses on the development of the key process: the epitaxial deposition of the base and emitter layers through via holes in the substrate. Samples have been produced and characterised using cross-sections, spreading resistance profiling, conductance-type testing and defect etching. The deposition technique and methods of controlling and optimising the process are discussed.
Keywords :
Crystallization; Epitaxial growth; Etching; Optimization methods; Photovoltaic cells; Semiconductor thin films; Silicon; Substrates; Testing; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location :
San Diego, CA, USA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-1640-0
Electronic_ISBN :
0160-8371
Type :
conf
DOI :
10.1109/PVSC.2008.4922853
Filename :
4922853
Link To Document :
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