Space environmental effects on thin film dielectrics

A general overview of the space environment is presented with particular emphasis on the effects of atomic oxygen (AO) and vacuum ultraviolet (VUV) radiation on the erosion of thin film dielectric materials. A description of a ground-based simulation facility is given together with experimental results, including comparisons with space flight data, for a variety of dielectrics. Protective coatings were also examined using quartz crystal microbalances to obtain in-situ mass loss measurements. Electrical property test results are presented for both uncoated and coated dielectrics in terms of their charge dissipation and arc discharge characteristics