• DocumentCode
    3386317
  • Title

    Influence of the Al mole fraction on microwave noise performance of AlxGa1-xN/GaN HEMTs

  • Author

    Xu, Yuehang ; Guo, Yunchuan ; Wu, Yunqiu ; Xu, Ruimin ; Yan, Bo

  • Author_Institution
    EHF Key Lab. of Fundamental Sci., Univ. of Electron. Sci. & Technol. of China (UESTC), Chengdu, China
  • fYear
    2009
  • fDate
    23-25 July 2009
  • Firstpage
    759
  • Lastpage
    761
  • Abstract
    To reveal the influence of Al mole fraction on the microwave noise performance of AlxGa1-xN/GaN HEMTs, numerical analysis is performed on the intrinsic noise by reducing its value from 35% to 25% and 15% in this paper. A model based on measurement results is used and simulations are carried out by commercial TCAD soft Silvaco Atlas. The I-V curves and both of the gate and drain noise spectral density are calculated and compared at different bias. The results show that the reduction of the Al mole fraction degrades the intrinsic microwave noise behavior of HEMT´s only at high bias currents due to the poor carrier confinement. The AlGaN/GaN HEMTs with 25 % Al content has the best minimum noise figure (Fmin) at low bias currents due to the reduction of gate noise, and it has the same Fmin with 35% at a few higher bias current.
  • Keywords
    aluminium compounds; gallium compounds; high electron mobility transistors; AlxGa1-xN-GaN; HEMT; I-V curves; commercial TCAD soft Silvaco Atlas; microwave noise performance; Acoustical engineering; Artificial intelligence; Degradation; Gallium nitride; HEMTs; MODFETs; Microwave devices; Noise figure; Noise reduction; Numerical analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications, Circuits and Systems, 2009. ICCCAS 2009. International Conference on
  • Conference_Location
    Milpitas, CA
  • Print_ISBN
    978-1-4244-4886-9
  • Electronic_ISBN
    978-1-4244-4888-3
  • Type

    conf

  • DOI
    10.1109/ICCCAS.2009.5250398
  • Filename
    5250398