Title :
Thermal and dielectric breakdown for metal insulator metal capacitors (MIMCAP) with tantalum pentoxide dielectric
Author :
Allers, K.-H. ; Schwab, R. ; Walter, W. ; Schrenk, M. ; Korner, H.
Author_Institution :
Infineon Technolgies AG, Munich, Germany
Abstract :
Wafer level constant voltage stress of metal insulator metal capacitors, with Ta2O5 dielectric show a bimodal time to failure distributions. The two regimes of times to breakdown are separated by 2 orders of magnitude in time and this gap cannot be accessed with any constant voltage stress condition. The early failure mode is explained by thermal runaway model based on positive feedback loop: the high power dissipation in the MIM capacitors leads to an temperature increase, which in turn increases the leakage current of the dielectric and thus increases the power dissipation. This simple model explains a thermally unstable stress mode at high voltages and a thermally stable mode at lower voltages. The predicted critical current density at the beginning of the stress is consistent with experimental results. The temperature activation of the leakage current mechanism is shown to be 0.7eV. Other potential explanations for the early failure mode are discussed.
Keywords :
MIM devices; capacitors; electric breakdown; failure analysis; leakage currents; tantalum compounds; activation energy; constant voltage stress; critical current density; dielectric breakdown; leakage current; metal-insulator-metal capacitor; positive feedback; power dissipation; tantalum pentoxide dielectric; thermal breakdown; thermal runaway; time-to-failure distribution; Breakdown voltage; Capacitors; Dielectric breakdown; Dielectrics and electrical insulation; Feedback loop; Leakage current; Metal-insulator structures; Power dissipation; Temperature; Thermal stresses;
Conference_Titel :
Integrated Reliability Workshop Final Report, 2002. IEEE International
Print_ISBN :
0-7803-7558-0
DOI :
10.1109/IRWS.2002.1194242