DocumentCode
3387144
Title
Real case study of SWEAT EM test on via/line structure as process reliability monitor methodology
Author
Andrew, K. L Yap ; Lim, Bee Hoon ; Yap, H.K. ; Tan, Y.C. ; Lo, K.F.
fYear
2002
fDate
21-24 Oct. 2002
Firstpage
165
Lastpage
167
Abstract
SWEAT (Standard Wafer-level Electromigration Acceleration Test) is one of the various rapid electromigration test techniques proposed for quick monitoring of metal interconnect reliability performance in production line. We have successfully applied the SWEAT test on via/line structure to monitor and screen maverick or defective lots in production. In this work, we present real case studies to illustrate SWEAT test effectiveness as reliability screens and monitor.
Keywords
electromigration; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; process monitoring; SWEAT EM test; metal interconnect; process reliability monitoring; standard wafer-level electromigration acceleration test; via/line structure; Computer aided software engineering; Electromigration; Life estimation; Monitoring; Production; Semiconductor device testing; Software testing; Stress; System testing; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2002. IEEE International
Print_ISBN
0-7803-7558-0
Type
conf
DOI
10.1109/IRWS.2002.1194259
Filename
1194259
Link To Document