• DocumentCode
    3387144
  • Title

    Real case study of SWEAT EM test on via/line structure as process reliability monitor methodology

  • Author

    Andrew, K. L Yap ; Lim, Bee Hoon ; Yap, H.K. ; Tan, Y.C. ; Lo, K.F.

  • fYear
    2002
  • fDate
    21-24 Oct. 2002
  • Firstpage
    165
  • Lastpage
    167
  • Abstract
    SWEAT (Standard Wafer-level Electromigration Acceleration Test) is one of the various rapid electromigration test techniques proposed for quick monitoring of metal interconnect reliability performance in production line. We have successfully applied the SWEAT test on via/line structure to monitor and screen maverick or defective lots in production. In this work, we present real case studies to illustrate SWEAT test effectiveness as reliability screens and monitor.
  • Keywords
    electromigration; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; process monitoring; SWEAT EM test; metal interconnect; process reliability monitoring; standard wafer-level electromigration acceleration test; via/line structure; Computer aided software engineering; Electromigration; Life estimation; Monitoring; Production; Semiconductor device testing; Software testing; Stress; System testing; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2002. IEEE International
  • Print_ISBN
    0-7803-7558-0
  • Type

    conf

  • DOI
    10.1109/IRWS.2002.1194259
  • Filename
    1194259