High speed ablation of glass using TEA-CO/sub 2/ laser

Author

Cheon Lee ; Tsunemi, A. ; Sugioka, K.

Author_Institution

Dept. of Electr. Eng., Inha Univ., Inchon, South Korea

fYear

1996

fDate

5-9 Aug. 1996

Firstpage

26

Lastpage

27

Abstract

Laser ablation has been applied to synthetic quartz and BK-7 glasses using the TEA-CO/sub 2/ laser for maskless high speed etching. The TEA-CO/sub 2/ laser beam with a 10.6 /spl mu/m wavelength and 80 ns pulse duration was focused by a ZnSe lens down to a spot diameter of about 400 /spl mu/m on the sample surface. The repetition-rates of laser were varied from 1 pps to 1000 pps to investigate the dependence of ablation rate on the repetition rate. The ablation was performed at atmospheric pressure and in a vacuum of 4.2 x 10/sup -5/ Torr. Ablated profiles including depth and width are observed by a surface profiler and optical microscopy. The chemical compositions of the ablated bottoms were measured by electron probe microanalysis.

Keywords

electron probe analysis; laser ablation; laser beam etching; optical microscopy; quartz; 1 atm; 10.6 mum; 4.2E-5 torr; BK-7 glasses; CO/sub 2/; SiO/sub 2/; TEA-CO/sub 2/ laser; ablation rate; chemical composition; electron probe microanalysis; high speed ablation; maskless high speed etching; optical microscopy; repetition-rate; surface profilometry; synthetic quartz glass; Etching; Glass; Laser ablation; Laser beams; Lenses; Optical microscopy; Optical pulses; Optical surface waves; Surface waves; Zinc compounds;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Applications of Lasers in Materials Processing/Broadband Optical Networks/Smart Pixels/Optical MEMs and Their Applications. IEEE/LEOS 1996 Summer Topical Meetings:

Conference_Location

Keystone, CO, USA

Print_ISBN

0-7803-3175-3

Type

conf

DOI

10.1109/LEOSST.1996.540663

Filename

540663