DocumentCode
3387340
Title
0.2V adiabatic NC-FinFET with 0.6mA/µm ION and 0.1nA/µm IOFF
Author
Chenming Hu ; Salahuddin, Sayeef ; Cheng-I Lin ; Khan, Asif
Author_Institution
Dept. of EECS, Univ. of California, Berkeley, Berkeley, CA, USA
fYear
2015
fDate
21-24 June 2015
Firstpage
39
Lastpage
40
Abstract
We present for the first time a Negative Capacitance (NC) FinFET. Simulation shows 0.2V operation with 0.6mA/μm on-current and 100pA/μm leakage current. A simple model guides the optimization of the ferroelectric film and the FinFET in the NC-FinFET. Our finding that a weak ferroelectric material is preferable greatly increases the candidate material classes and we report the target properties to search for. Counterintuitively, the gate to S/D capacitance and a thicker EOT both reduce the required VDD. NC-FinFET is good for high performance and very low power applications.
Keywords
MOSFET; ferroelectric semiconductors; leakage currents; optimisation; semiconductor device models; S-D capacitance; adiabatic NC-FinFET; ferroelectric film; ferroelectric material; leakage current; negative capacitance; voltage 0.2 V; CMOS integrated circuits; Capacitance; Epitaxial growth; Logic gates; Metals; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2015 73rd Annual
Conference_Location
Columbus, OH
Print_ISBN
978-1-4673-8134-5
Type
conf
DOI
10.1109/DRC.2015.7175542
Filename
7175542
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