• DocumentCode
    3387340
  • Title

    0.2V adiabatic NC-FinFET with 0.6mA/µm ION and 0.1nA/µm IOFF

  • Author

    Chenming Hu ; Salahuddin, Sayeef ; Cheng-I Lin ; Khan, Asif

  • Author_Institution
    Dept. of EECS, Univ. of California, Berkeley, Berkeley, CA, USA
  • fYear
    2015
  • fDate
    21-24 June 2015
  • Firstpage
    39
  • Lastpage
    40
  • Abstract
    We present for the first time a Negative Capacitance (NC) FinFET. Simulation shows 0.2V operation with 0.6mA/μm on-current and 100pA/μm leakage current. A simple model guides the optimization of the ferroelectric film and the FinFET in the NC-FinFET. Our finding that a weak ferroelectric material is preferable greatly increases the candidate material classes and we report the target properties to search for. Counterintuitively, the gate to S/D capacitance and a thicker EOT both reduce the required VDD. NC-FinFET is good for high performance and very low power applications.
  • Keywords
    MOSFET; ferroelectric semiconductors; leakage currents; optimisation; semiconductor device models; S-D capacitance; adiabatic NC-FinFET; ferroelectric film; ferroelectric material; leakage current; negative capacitance; voltage 0.2 V; CMOS integrated circuits; Capacitance; Epitaxial growth; Logic gates; Metals; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2015 73rd Annual
  • Conference_Location
    Columbus, OH
  • Print_ISBN
    978-1-4673-8134-5
  • Type

    conf

  • DOI
    10.1109/DRC.2015.7175542
  • Filename
    7175542