Tailoring of chemical, morphological, and mechanical surface properties of materials with laser radiation

Author

Kreutz, E.W.

Author_Institution

Tech. Hochschule Aachen, Germany

fYear

1996

fDate

5-9 Aug. 1996

Firstpage

53

Lastpage

55

Abstract

Following the requirements for present microsystems the necessary resolutions are restricted to about 100 /spl Aring/ in vertical direction and to higher than 10 /spl mu/m in lateral direction, respectively. The author shows that laser radiation has now found confirmed applications in the prototyping stages of device engineering and is now on the edge of also becoming a cornerstone technology in manufacturing of leading-edge devices.

Keywords

laser materials processing; semiconductors; surface chemistry; surface structure; surface treatment; 10 mum; 100 A; chemical properties; laser radiation; leading-edge devices; mechanical surface properties; microsystems; morphological properties; prototyping stages; resolution; Chemical lasers; Lithography; Mechanical factors; Microelectronics; Optical devices; Optical materials; Packaging; Semiconductor materials; Surface emitting lasers; Surface morphology;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Applications of Lasers in Materials Processing/Broadband Optical Networks/Smart Pixels/Optical MEMs and Their Applications. IEEE/LEOS 1996 Summer Topical Meetings:

Conference_Location

Keystone, CO, USA

Print_ISBN

0-7803-3175-3

Type

conf

DOI

10.1109/LEOSST.1996.540675

Filename

540675