DocumentCode
3388922
Title
Improving accuracy and flexibility of ASTM D 5470 for high performance thermal interface materials
Author
Kearns, D.
Author_Institution
Sun Microsystems, Inc, San Diego, CA, USA
fYear
2003
fDate
11-13 March 2003
Firstpage
129
Lastpage
133
Abstract
The thermal demands of current and next generation microprocessors have driven requirements for thermal interface materials (TIMs) to the point where reliable vendor data is often not available. Vendors are struggling to meet customers needs. Existing industry test standards were intended for electrical insulation materials and cannot provide accurate data for todays high performance TIMs. Manufacturers are forced to accept vendor data at risk, pay for outside testing, or bring testing in-house. This paper discusses the latter where a commercially available thermal conductivity test apparatus was brought in-house, and modifications were defined and implemented to improve its versatility and accuracy. Details of those modifications and results of validation testing are presented where accuracy is improved by an order of magnitude over the standard apparatus. The method allows for variation of contact surface type, roughness, pressure, temperature, etc.
Keywords
materials testing; measurement standards; thermal conductivity measurement; thermal management (packaging); thermal resistance measurement; ASTM D 5470 measurement standard accuracy; RTD; TIM; contact surface type variation; high performance thermal interface materials; industry test standards; interface thermal resistance; microprocessor thermal demands; surface pressure; surface roughness; surface temperature; thermal conductivity testing; thermal contact resistance; vendor data; Conducting materials; Dielectrics and electrical insulation; Insulation testing; Manufacturing industries; Materials reliability; Materials testing; Microprocessors; Rough surfaces; Surface roughness; Thermal conductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Thermal Measurement and Management Symposium, 2003. Ninteenth Annual IEEE
ISSN
1065-2221
Print_ISBN
0-7803-7793-1
Type
conf
DOI
10.1109/STHERM.2003.1194350
Filename
1194350
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