Title :
Waveguide Integrated Ge p-i-n Photodetectors on a Silicon-on-Insulator Platform
Author :
Liu, J.f. ; Ahn, D. ; Hong, C. ; Pan, D. ; Jongthammanurak, S. ; Beals, M. ; Kimerling, L. ; Michel, J. ; Pomerene, A. ; Carothers, D. ; Hill, C. ; Jaso, M. ; Tu, K. ; Chen, Y. ; Patel, S. ; Rasras, M. ; Gill, D. ; White, A.
Author_Institution :
Dept. of Mater. Sci. & Eng., Massachusetts Inst. of Technol., Cambridge, MA
Abstract :
We present selectively grown Ge p-i-n photodetectors coupled to high index contrast Si(core)/SiO2(cladding) waveguides on a silicon-on-insulator (SOI) platform. Two coupling schemes, namely butt-coupling and vertical coupling, were demonstrated in this study. With the butt-coupling scheme we have achieved a high responsivity of 1.0 A/W at 1520 nm and a 3 dB bandwidth greater than 4.5 GHz at 1550 nm. With the vertical coupling scheme, where the light couples from a Si waveguide evanescently to the Ge detector on top of it, a responsivity of 0.22 A/W and a 3 dB bandwidth of ~1.5 GHz have been demonstrated at 1550 nm. The devices were fabricated on a standard 180 nm industrial complementary metal oxide semiconductor production (CMOS) line, and can be integrated with CMOS circuitry for electronic and photonic integrated circuits
Keywords :
germanium; integrated optoelectronics; optical couplers; optical fabrication; optical waveguides; photodetectors; silicon-on-insulator; 1520 nm; 1550 nm; 180 nm; CMOS; Ge; Si-SiO2; butt-coupling scheme; device fabrication; electronic integrated circuits; high index contrast waveguides; industrial complementary metal oxide semiconductor production line; photonic integrated circuits; silicon-on-insulator platform; vertical coupling scheme; waveguide integrated Ge p-i-n photodetectors; Bandwidth; Electronics industry; Metal product industries; Metals industry; Optical coupling; PIN photodiodes; Photodetectors; Semiconductor waveguides; Silicon on insulator technology; Textile industry;
Conference_Titel :
Optoelectronics, 2006 Optics Valley of China International Symposium on
Conference_Location :
Wuhan
Print_ISBN :
1-4244-0816-4
DOI :
10.1109/OVCISO.2006.302697