Influence of defect capture rate on defect-yield-correlations and generally defect control strategies

Author

Tochtrop, Thomas

Author_Institution

Philips Semicond. GmbH, Boblingen, Germany

fYear

2003

fDate

31 March-1 April 2003

Firstpage

17

Lastpage

28

Abstract

The influence of defect capture rate on defect line control and defect-yield-correlations is discussed. Practical examples reveal, that even for "biggest killing defects" capture rates are far below 100%. An overview about associated defect line control problems is given. A simple model, taking recipe parameters such like gain and threshold into account is discussed to describe one origin. Three examples are given which prove the strong influence of capture rate variations on practical aspects of defectivity. This realization enforces to revise defect line control strategies and defect-yield-correlation models.

Keywords

correlation methods; integrated circuit yield; process monitoring; production control; binmap correlation; capture rate variations; defect capture rate; defect line control strategies; defect-yield-correlation models; defect-yield-correlations; defectivity; gain; kill ratio; recipe parameters; semiconductor manufacturing; threshold; Condition monitoring; Inspection; Laser modes; Laser theory; Measurement techniques; Particle measurements; Performance evaluation; Semiconductor device measurement; Semiconductor device modeling; Stacking;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI

ISSN

1078-8743

Print_ISBN

0-7803-7681-1

Type

conf

DOI

10.1109/ASMC.2003.1194461

Filename

1194461