DocumentCode :
3390534
Title :
Simulation study of dimensional effect on bipolar resistive random access memory (RRAM)
Author :
Liu Kai ; Zhang Kailiang ; Wang Fang ; Zhao Jinshi ; Wei Jun
Author_Institution :
Tianjin Key Lab. of Film Electron. & Commun. Devices, Tianjin Univ. of Technol., Tianjin, China
fYear :
2013
fDate :
2-4 Jan. 2013
Firstpage :
306
Lastpage :
308
Abstract :
The dependency of the RRAM device electrical parameters such as set voltage, reset current and resistance on the RRAM cell dimensional scalability is investigated with Monte Carlo simulation to optimize the power consumption of bipolar RRAM. It is found in the simulation that the switching process in bipolar RRAM is related to the cell dimension in the sub-nm region in terms of its horizontal length. The suppressing effect of existing conducting filament is also discussed. With optimal cell size sufficient initial resistance and a low forming voltage will be achieved, accelerating the feasibility of the high-density low-power RRAM.
Keywords :
Monte Carlo methods; low-power electronics; random-access storage; Monte Carlo simulation; RRAM device electrical parameters; bipolar resistive random access memory; cell dimension; cell dimensional scalability; conducting filament; high-density low-power RRAM; horizontal length; low forming voltage; optimal cell size sufficient initial resistance; power consumption optimization; reset current; set voltage; sub-nm region; switching process; Conferences; Decision support systems; Erbium; Nanoelectronics; Resistance; RRAM; electric parameter and computational simulation; power consumption;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2013 IEEE 5th International
Conference_Location :
Singapore
ISSN :
2159-3523
Print_ISBN :
978-1-4673-4840-9
Electronic_ISBN :
2159-3523
Type :
conf
DOI :
10.1109/INEC.2013.6466031
Filename :
6466031
Link To Document :
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