Title :
Simultaneous subthreshold and gate-oxide tunneling leakage current analysis in nanometer CMOS design
Author :
Lee, Dongwoo ; Kwong, Wesley ; Blaauw, David ; Sylvester, Dennis
Author_Institution :
Michigan Univ., Ann Arbor, MI, USA
Abstract :
In this paper we develop a fast approach to analyze the total leakage power of a large circuit block, considering both gate leakage, Igate, and subthreshold leakage, Isub. The interaction between Isub and Igate complicates analysis in arbitrary CMOS topologies. We propose simple and accurate heuristics to quickly estimate the state-dependent total leakage current considering the interaction between Isub and Igate. We apply this method to ISCAS benchmark circuits in a projected 100 nm technology and demonstrate excellent accuracy compared to SPICE simulation with a 20,000X speedup on average.
Keywords :
CMOS digital integrated circuits; integrated circuit design; integrated circuit modelling; leakage currents; nanoelectronics; tunnelling; ISCAS benchmark circuits; SPICE simulation; arbitrary CMOS topologies; circuit block; gate leakage; gate oxide tunneling leakage current analysis; heuristics; leakage power; nanometer CMOS design; state dependent total leakage current; subthreshold leakage; Circuits; Curve fitting; Gate leakage; Leakage current; Minimization; Nonlinear equations; Predictive models; Semiconductor device modeling; Tunneling; Voltage;
Conference_Titel :
Quality Electronic Design, 2003. Proceedings. Fourth International Symposium on
Print_ISBN :
0-7695-1881-8
DOI :
10.1109/ISQED.2003.1194747