• DocumentCode
    3395430
  • Title

    Comparison of defect size distributions based on electrical and optical measurement procedures

  • Author

    Hess, Christopher ; Weiland, Larg H.

  • Author_Institution
    Inst. of Comput. Design & Fault Tolerance, Karlsruhe Univ., Germany
  • fYear
    1997
  • fDate
    10-12 Sep 1997
  • Firstpage
    277
  • Lastpage
    282
  • Abstract
    Defect size distributions play an important role in process characterization and yield prediction. To determine efficient procedures to extract defect size distributions, a database was set up that consists of hundreds of defect images to provide defect size distributions also reflecting irregular outlines of defects. Further investigation shows that even a single extension value per defect may provide a precise size distribution. Furthermore, the proposed Harp Test Structure (HTS) containing hundreds of parallel lines will also provide a defect size distribution, but it is based on electrical measurements only. The comparison of defect size distributions using both measurement procedures shows that not only optical measurements, but also electrical measurements at a Harp Test Structure are sufficient to obtain a precise defect size distribution that also enables size distribution modeling for yield prediction
  • Keywords
    electric variables measurement; integrated circuit measurement; integrated circuit testing; integrated circuit yield; production testing; spatial variables measurement; statistical analysis; IC yield prediction; defect image database; defect size distributions; electrical measurement procedures; harp test structure; optical measurement procedures; process characterization; Bridges; Conductivity; Data mining; Electric variables measurement; Optical design; Optical scattering; Particle measurements; Semiconductor device measurement; Size measurement; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-4050-7
  • Type

    conf

  • DOI
    10.1109/ASMC.1997.630748
  • Filename
    630748