• DocumentCode
    3396723
  • Title

    Design and study of piezoresistive polycrystalline silicon sensor

  • Author

    Li, Ye ; Zhang, Ping

  • Author_Institution
    Zhenjiang High Vocational Technol. Sch., Zhenjiang, China
  • Volume
    3
  • fYear
    2010
  • fDate
    9-10 Oct. 2010
  • Firstpage
    202
  • Lastpage
    205
  • Abstract
    Piezoresistive polycrystalline silicon sensor has the advantages of high sensitivity and nice stability as well as not hard to manufacture, so it is suitable for measuring the ultra-micro pressure. The mature polycrystalline silicon is adopted as sensitive material for the sensor in this paper. Two island-beam structure is used as the chip; stress dissipative structure has been designed; the mask structure is discussed in detail. The sensor can match the need of ultra-micro pressure measurement and overload protection. A detailed study of the structure is developed by the applications of finite element analyses (FEA) software. The study offers important reference to the optimization of the sensor chip. Finally, the paper studies the static and dynamic performance of the sensor. We find that the structure we designed here has good linearity, high overload protection and good sensitivity. It is suitable for measuring 500Pa micro pressure.
  • Keywords
    finite element analysis; pressure measurement; pressure sensors; stress measurement; finite element analyses software; mask structure; overload protection; piezoresistive polycrystalline silicon sensor; pressure measurement; stress dissipative structure; ultra micro pressure; FEM; micro pressure sensor; polycrystalline silicon; strain diaphragm; stress dissipative structure;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Future Information Technology and Management Engineering (FITME), 2010 International Conference on
  • Conference_Location
    Changzhou
  • Print_ISBN
    978-1-4244-9087-5
  • Type

    conf

  • DOI
    10.1109/FITME.2010.5655430
  • Filename
    5655430