Title :
New applications of cross-talk-based capacitance measurements [CMOS ICs]
Author :
Vendrame, L. ; Bortesi, L. ; Bogliolo, A.
Author_Institution :
FTM R&D, STMicroelectron., Agrate Brianza, Italy
Abstract :
Charge-based capacitance measurements (CBCMs) are widely used to estimate on-chip wiring capacitances because of their accuracy and simplicity. Enhanced CMOS transducers for CBCM have been recently proposed that exploit cross-talk to selectively measure cross-coupling capacitances. In this paper, we propose two new applications of cross-talk-based capacitance measurements: mismatch measurement of stacked metal-metal capacitor pairs, and localization of wire interruptions. We present the measurement techniques, we discuss their implementation and we report preliminary experimental results.
Keywords :
CMOS integrated circuits; capacitance measurement; coupled circuits; integrated circuit interconnections; integrated circuit measurement; integrated circuit noise; CMOS CBCM transducers; charge-based capacitance measurement; cross-coupling capacitances; cross-talk-based capacitance measurement; mismatch measurement; on-chip wiring capacitances; stacked metal-metal capacitor pairs; wire interruption localization; Capacitance measurement; Capacitors; Current measurement; Current supplies; Research and development; Switches; Transducers; Voltage; Wire; Wiring;
Conference_Titel :
Microelectronic Test Structures, 2005. ICMTS 2005. Proceedings of the 2005 International Conference on
Print_ISBN :
0-7803-8855-0
DOI :
10.1109/ICMTS.2005.1452283