• DocumentCode
    3397094
  • Title

    The role of self-directed work teams in a concurrent, multi-generation semiconductor process development effort

  • Author

    Weber, Charles ; Rosner, Jeff ; Chang, Patrick

  • Author_Institution
    Integrated Circuit Technol. Dev. Center, Hewlett-Packard Co., Palo Alto, CA, USA
  • fYear
    1997
  • fDate
    10-12 Sep 1997
  • Firstpage
    322
  • Lastpage
    327
  • Abstract
    An integrated circuit process R&D facility concurrently conducts advanced research, process control and product prototyping of three Very Large Scale Integrated Circuit process generations. Self-managed inter-departmental teams of process engineers and device physicists govern most aspects of process integration through a peer review process, and collectively design short cycle experiments. Organizational structures are adjusted to minimize the number of communication channels. Key metrics traditionally associated with process integration improve by a factor of three
  • Keywords
    VLSI; integrated circuit technology; process control; research and development management; IC process R&D facility; VLSI fabrication; advanced research; organizational structure adjustment; peer review process; process control; process integration; product prototyping; self-directed work teams; self-managed inter-departmental teams; semiconductor process development; short cycle experiments design; Collaboration; Collaborative work; Design engineering; Educational institutions; Engineering management; Integrated circuit technology; Process control; Reliability engineering; Research and development; Scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-4050-7
  • Type

    conf

  • DOI
    10.1109/ASMC.1997.630756
  • Filename
    630756