DocumentCode :
3397530
Title :
Staffing analysis tool for operator-machine-lot interference in semiconductor manufacturing
Author :
Meyersdorf, Doron ; Biron, Ori ; Ozelkan, Ertunga C. ; Fowler, John W.
Author_Institution :
Ind. Eng. & Syst. Anal. Ltd., Foster City, CA, USA
fYear :
1997
fDate :
10-12 Sep 1997
Firstpage :
335
Lastpage :
340
Abstract :
This paper describes the concepts underlying a new staffing tool, which evaluates staffing requirements, plan future shift sizes, perform sensitivity analysis, and locate and measure improvement opportunities in terms of worker operations. The model is based on M/M/S/K queuing theory to analyze the operator-machine-lot (OML) interference especially in semiconductor manufacturing processes. Unlike classical approaches, in which the machines are treated as customers, here wafer lots are taken as the designated customers to be serviced. A comparison of a simulation, OML, and a traditional M/M/S/K model (where the machines are modeled as customers) shows that OML model yields much closer results to the simulation than the traditional M/M/S/K model. Furthermore, from the computational point of view OML is more efficient than the simulation model which can be very time consuming especially in the complex semiconductor manufacturing environment. Thus, OML model is a superior alternative to the classical interference modeling and facilitates staffing recommendations that improve overall equipment effectiveness (GEE) and therefore productivity
Keywords :
computer aided production planning; human resource management; integrated circuit manufacture; personnel; queueing theory; semiconductor device manufacture; sensitivity analysis; M/M/S/K queuing theory; operator-machine-lot interference; productivity; semiconductor manufacturing; sensitivity analysis; shift size planning; staffing analysis tool; staffing requirements evaluation; wafer lot; worker operations; Computational modeling; Computer aided manufacturing; Interference; Manufacturing processes; Performance evaluation; Queueing analysis; Semiconductor device modeling; Sensitivity analysis; Size measurement; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
Conference_Location :
Cambridge, MA
ISSN :
1078-8743
Print_ISBN :
0-7803-4050-7
Type :
conf
DOI :
10.1109/ASMC.1997.630758
Filename :
630758
Link To Document :
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