DocumentCode
3397962
Title
Frequency dispersion in GaAs metal-semiconductor field-effect transistor transconductance
Author
Prokhorov, E.F. ; Gorev, N.B. ; Kodzhespirova, I.F. ; Privalov, E.N.
Author_Institution
Centro de Investig. en Materialos Av., Chihuahua
fYear
2008
fDate
8-12 Sept. 2008
Firstpage
143
Lastpage
144
Abstract
A quasi-2D numerical model a GaAs metal-semiconductor field-effect transistor, which drops the conventional sharp-boundary approximation, is presented. Using this model, both the low- and the high-frequency transistor transconductance is calculated. It is shown that the transconductance shows marked frequency dispersion in the drain current saturation region, which may have a significant impact on the small-signal voltage gain of a transistor amplifier.
Keywords
III-V semiconductors; Schottky gate field effect transistors; amplifiers; gallium arsenide; GaAs; conventional sharp-boundary approximation; drain current saturation; frequency dispersion; high-frequency transistor transconductance; low-frequency transistor transconductance; metal-semiconductor field-effect transistor transconductance; quasi-2D numerical model; small-signal voltage gain; transistor amplifier; Electronic mail; FETs; Frequency; Gallium arsenide; Intrusion detection; MESFETs; Metals industry; Substrates; Threshold voltage; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave & Telecommunication Technology, 2008. CriMiCo 2008. 2008 18th International Crimean Conference
Conference_Location
Sevastopol, Crimea
Print_ISBN
978-966-335-166-7
Electronic_ISBN
978-966-335-169-8
Type
conf
DOI
10.1109/CRMICO.2008.4676324
Filename
4676324
Link To Document