DocumentCode :
3398125
Title :
Effect of lateral-field distribution on hot-carrier analysis in short-channel MOSFETs
Author :
El-Banna, M. ; El Nokali, M.
Author_Institution :
Dept. of Electr. Eng., Alexandria Univ., Egypt
fYear :
1991
fDate :
14-17 May 1991
Firstpage :
799
Abstract :
A previously developed quasi-two-dimensional model is used to examine the effect of the lateral-field distribution in the drain region on the different components of current in short-channel MOSFETs. Uniform, linear, and parabolic distributions are included in the model for the first time. Hot-carrier currents are found to be consistent with the experimental data available in the literature when a linear field distribution is assumed. The gate current is shown to be more sensitive than the substrate current to the selection of the field distribution. The more nonlinear the field distribution is, the longer the minimum channel length for reliable MOSFETs will be. Devices less than 0.5 μm in channel-length are insensitive to the field distribution
Keywords :
hot carriers; insulated gate field effect transistors; semiconductor device models; 2D model; drain region; gate current; hot-carrier analysis; lateral-field distribution; minimum channel length; quasi-two-dimensional model; short-channel MOSFETs; substrate current; Charge carrier processes; Electron emission; Hot carrier effects; Hot carriers; Impact ionization; Interface states; MOSFETs; Probes; Resistance heating; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 1991., Proceedings of the 34th Midwest Symposium on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-0620-1
Type :
conf
DOI :
10.1109/MWSCAS.1991.251992
Filename :
251992
Link To Document :
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