Title :
Anisotropic Wet Etching in Application of SOI-based Nano-Optoelectronic Devices
Author :
Sun, Fei ; Zhou, Zhiping
Author_Institution :
Huazhong Univ. of Sci. & Technol., Wuhan
fDate :
July 29 2007-Aug. 11 2007
Abstract :
A size reduction technology based on anisotropic wet etching is presented, which can break through the limitation of lithography resolution and find extensive application in SOI-based nano-optoelectronic devices.
Keywords :
etching; nanoelectronics; optoelectronic devices; silicon-on-insulator; SOI-based nano-optoelectronic devices; anisotropic wet etching; size reduction technology; Anisotropic magnetoresistance; Geometrical optics; Nanoscale devices; Optical devices; Optical interconnections; Optical interferometry; Optical surface waves; Optical waveguides; Sun; Wet etching;
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
DOI :
10.1109/INOW.2007.4302910
