DocumentCode :
3398549
Title :
Structure Study of Amorphous SiOx Films
Author :
Yi, Lixin ; Wang, Shenwei ; Wang, Yang ; Chunjun Liang ; Huang, Sheng ; Du, Yufan ; Wu, Yang
Author_Institution :
Beijing Jiaotong Univ., Beijing
fYear :
2007
fDate :
July 29 2007-Aug. 11 2007
Firstpage :
134
Lastpage :
135
Abstract :
Two FTIR spectra bands of amorphous SiOx films prepared by sputtering technology were detected. Different structures corresponding to them were studied according to the CFM mode and RBM mode.
Keywords :
Fourier transform spectra; amorphous state; infrared spectra; silicon compounds; sputter deposition; FTIR spectra bands; SiO; amorphous films; sputtering technology; Absorption; Amorphous materials; Deconvolution; Educational technology; Intelligent control; Laboratories; Optical films; Size control; Sputtering; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
Type :
conf
DOI :
10.1109/INOW.2007.4302918
Filename :
4302918
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3398549
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