• DocumentCode
    3398549
  • Title

    Structure Study of Amorphous SiOx Films

  • Author

    Yi, Lixin ; Wang, Shenwei ; Wang, Yang ; Chunjun Liang ; Huang, Sheng ; Du, Yufan ; Wu, Yang

  • Author_Institution
    Beijing Jiaotong Univ., Beijing
  • fYear
    2007
  • fDate
    July 29 2007-Aug. 11 2007
  • Firstpage
    134
  • Lastpage
    135
  • Abstract
    Two FTIR spectra bands of amorphous SiOx films prepared by sputtering technology were detected. Different structures corresponding to them were studied according to the CFM mode and RBM mode.
  • Keywords
    Fourier transform spectra; amorphous state; infrared spectra; silicon compounds; sputter deposition; FTIR spectra bands; SiO; amorphous films; sputtering technology; Absorption; Amorphous materials; Deconvolution; Educational technology; Intelligent control; Laboratories; Optical films; Size control; Sputtering; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-1591-5
  • Type

    conf

  • DOI
    10.1109/INOW.2007.4302918
  • Filename
    4302918
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3398549