DocumentCode :
3398582
Title :
Study on Crystal Quality of RF Magnetron Sputtered Si1-XGex Films for Thermoelectric Applications
Author :
Zhang, Li-Chong ; Xiong, Bing ; Luo, Yi
Author_Institution :
Tsinghua Univ., Beijing
fYear :
2007
fDate :
July 29 2007-Aug. 11 2007
Firstpage :
138
Lastpage :
139
Abstract :
Improved polycrystalline characteristics have been demonstrated for Si1-xGex thin films, which are deposited on (001) n-Si substrates by optimizing RF magnetron sputtering, annealed in high temperature environment and characterized by X-ray diffraction measurements.
Keywords :
Ge-Si alloys; X-ray diffraction; annealing; crystal structure; semiconductor materials; semiconductor thin films; sputter deposition; thermoelectricity; (001) n-Si substrates; RF magnetron sputtered films; Si; Si1-xGex; X-ray diffraction; annealing; crystal quality; polycrystalline thin films; thermoelectric applications; Annealing; Conducting materials; Radio frequency; Semiconductor superlattices; Sputtering; Substrates; Temperature; Thermal conductivity; Thermoelectricity; X-ray diffraction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
Type :
conf
DOI :
10.1109/INOW.2007.4302920
Filename :
4302920
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3398582
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